Chapter VII: DESIGN ENVIRONMENTS

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5: The MOSIS CMOS Submicron Technology

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The MOSIS CMOS submicron technology describes a scalable CMOS process that is fabricated by the MOSIS project of the University of Southern California. To obtain this technology, use the Change Current Technology... command of the Technology menu and select "mocmossub".

Figure 7.2

This technology defaults to 4 metal layers (shown here), but can also be changed so that it uses anywhere from 2 to 6 layers of metal. This is done with the Technology Options... command of the Technology menu and changing the "Metal layers" field in the "MOSOS CMOS Submicron" section.

Also, the technology can display with "stick figures" by using the Technology Options... command of the Technology menu and checking the "Stick Figures" button in the "MOSOS CMOS Submicron" section.


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